German: 7 PhD Positions at Fraunhofer Center Nanoelectronic Technologies, Dresden
7 PhD Positions at Fraunhofer Center Nanoelectronic Technologies, Dresden, Germany.
The Fraunhofer-Center Nanoelectronic Technologies (CNT) offers 7 PhD
positions:
1. PhD position: Investigation of wet and plasma based processes for
cleaning and treatment of wafers in the copper back end of line in
semiconductor manufacturing for different applications
The main focus of the thesis will be the wet and dry cleaning/ resist
removal of wafers with standard low-k and ultra low-k materials in the
copper backend of microprocessor manufacturing in sub 100 nm structures
without causing damage to these materials as well as the repair of
already damaged ultra low-k materials in these structures.
2. PhD position: Advanced Annealing for high speed CMOS - Process
development
Main focus will be the Advanced Annealing for high speed
CMOS-Development of processes You will gain experience regarding tool handling
(primarily assembly instructions and functionality of the components)
,support of the process qualifications, -monitoring ( SPC) as well as a setup
of a Trace Data Collection. In this context you work close together
with the AMD Diffusion/Integration Team and the tool supplier.
3. PhD position: Characterization of ALD-layers
The aim of the PhD project is to study the growth behavior of ALD
films. The project comprises both the deposition of the films and their
characterization with in-situ XPS. Existing evaluation routines will be
applied, their limitations will be assessed and improved routines will be
developed where necessary.
4. PhD position: Characterization of thin films with SIMS
The analysis-procedures for the composition of very thin high-k
dielectric films will be developed based on SIMS, TOF-SIMS, ARXPS, XRR, XRD,
AES. The procedures include the preparation of standards and the
assessment of sensitivity and repeatability. Based on these results and with
focus on SIMS the quantitative element analysis will be evaluated also
for analysis of stack systems with electrodes and dielectrics for
different devices.
5. PhD position: Preparation and characterization of new dielectrics
for DRAM application using ALD
The aim of the project is the identification of new high-k dielectrics
for the next generations of DRAM capacitors. The preparation of the
thin film capacitors will be realized with Atomic Layer Deposition (ALD).
One task is the investigation and improvement of the ALD processes
using new chemical routes.
6. PhD student position: Development of new technological concepts for
ALD
This project is focused on a better technological understanding of
Atomic Layer Deposition (ALD) processes. Technological investigations
comprise testing, evaluating and improving of precursor delivery systems and
basic studies regarding to the influence of the ALD chamber design. A
main challenge is to find correlations between technological and process
parameters and the layer homogeneity. Simulation of fluid dynamics and
ALD process steps will help to improve the chamber design.
7. PhD student position: Thin high-k dielectric films deposition based
on Atomic Layer Deposition (ALD)
Main target of the PhD Thesis will be research in the deposition of
very thin high-k dielectric films based on Atomic Layer Deposition (ALD)
technique. The candidate will perform the analysis of the ALD growth
mechanism for various material systems and conduct the physical and
electrical characterization of the deposited layers.
We invite graduate students from the field of materials science,
physics, chemistry, mechanical und electrical engineering and related areas
to send in their applications including covering letter, CV, copies of
diploma and related certificates / letter of recommendation / job
references solely via e-mail to Martin Landgraf. Details on each job position
can be found at http://www.cnt.fraunhofer.de/fhg/cnt/Jobs/index.jsp
Please send your application to:
Contact: Martin Landgraf
Address: Please send applications only by email
city: Dresden
PostCode: 01099
Phone: 0351-2607-3004
Email: jobs@cnt.fraunhofer.de
Need further information? Please contact:
contact: Martin Landgraf
Address: Please send applications only by email
city: Dresden
PostCode : 01099
Phone: 0351-2607-3004
Email: jobs@cnt.fraunhofer.de
URL: http://www.cnt.fraunhofer.de
-------------------------------------------------
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The Fraunhofer-Center Nanoelectronic Technologies (CNT) offers 7 PhD
positions:
1. PhD position: Investigation of wet and plasma based processes for
cleaning and treatment of wafers in the copper back end of line in
semiconductor manufacturing for different applications
The main focus of the thesis will be the wet and dry cleaning/ resist
removal of wafers with standard low-k and ultra low-k materials in the
copper backend of microprocessor manufacturing in sub 100 nm structures
without causing damage to these materials as well as the repair of
already damaged ultra low-k materials in these structures.
2. PhD position: Advanced Annealing for high speed CMOS - Process
development
Main focus will be the Advanced Annealing for high speed
CMOS-Development of processes You will gain experience regarding tool handling
(primarily assembly instructions and functionality of the components)
,support of the process qualifications, -monitoring ( SPC) as well as a setup
of a Trace Data Collection. In this context you work close together
with the AMD Diffusion/Integration Team and the tool supplier.
3. PhD position: Characterization of ALD-layers
The aim of the PhD project is to study the growth behavior of ALD
films. The project comprises both the deposition of the films and their
characterization with in-situ XPS. Existing evaluation routines will be
applied, their limitations will be assessed and improved routines will be
developed where necessary.
4. PhD position: Characterization of thin films with SIMS
The analysis-procedures for the composition of very thin high-k
dielectric films will be developed based on SIMS, TOF-SIMS, ARXPS, XRR, XRD,
AES. The procedures include the preparation of standards and the
assessment of sensitivity and repeatability. Based on these results and with
focus on SIMS the quantitative element analysis will be evaluated also
for analysis of stack systems with electrodes and dielectrics for
different devices.
5. PhD position: Preparation and characterization of new dielectrics
for DRAM application using ALD
The aim of the project is the identification of new high-k dielectrics
for the next generations of DRAM capacitors. The preparation of the
thin film capacitors will be realized with Atomic Layer Deposition (ALD).
One task is the investigation and improvement of the ALD processes
using new chemical routes.
6. PhD student position: Development of new technological concepts for
ALD
This project is focused on a better technological understanding of
Atomic Layer Deposition (ALD) processes. Technological investigations
comprise testing, evaluating and improving of precursor delivery systems and
basic studies regarding to the influence of the ALD chamber design. A
main challenge is to find correlations between technological and process
parameters and the layer homogeneity. Simulation of fluid dynamics and
ALD process steps will help to improve the chamber design.
7. PhD student position: Thin high-k dielectric films deposition based
on Atomic Layer Deposition (ALD)
Main target of the PhD Thesis will be research in the deposition of
very thin high-k dielectric films based on Atomic Layer Deposition (ALD)
technique. The candidate will perform the analysis of the ALD growth
mechanism for various material systems and conduct the physical and
electrical characterization of the deposited layers.
We invite graduate students from the field of materials science,
physics, chemistry, mechanical und electrical engineering and related areas
to send in their applications including covering letter, CV, copies of
diploma and related certificates / letter of recommendation / job
references solely via e-mail to Martin Landgraf. Details on each job position
can be found at http://www.cnt.fraunhofer.de/fhg/cnt/Jobs/index.jsp
Please send your application to:
Contact: Martin Landgraf
Address: Please send applications only by email
city: Dresden
PostCode: 01099
Phone: 0351-2607-3004
Email: jobs@cnt.fraunhofer.de
Need further information? Please contact:
contact: Martin Landgraf
Address: Please send applications only by email
city: Dresden
PostCode : 01099
Phone: 0351-2607-3004
Email: jobs@cnt.fraunhofer.de
URL: http://www.cnt.fraunhofer.de
-------------------------------------------------
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